Single Wafer Cleaning Machine Wafer Cleaning Machine

• Customization: Available
• After-sales Service: 1 Year
• Warranty: 1 Year
• Model NO.: HMLA-ZKX03
• Processing Wafer Size: 2-8 Inch Discs
• Quantity of Drying Per Session: One Piece
• Number of Stations: One
• Liqour Tank: Two
• Transport Package: Wooden Case
• Trademark: Himalaya
• Origin: China

Product Description

Product Description

A single wafer cleaning machine is a high cleanliness cleaning and drying equipment for materials such as semiconductor wafers. Through high-speed rotation, the liquid on the wafer is quickly dried and quickly dried to achieve high efficiency cleaning and drying effects. This device is particularly suitable for different sizes of wafers and can be adapted to different wafer sizes by changing the drying head. The main application areas of monolithic cleaning dryers include wet cleaning processes in semiconductor manufacturing. It is one of the key equipment in the wet cleaning process and is mainly used for the drying of 2-8 inch semiconductor wafers, mask plates and various other substrates. In addition, this device is also widely used in the field of LED epitaxy and chip manufacturing, is one of the indispensable equipment in these fields.

A. Equipment overview

1.1 Application fields: Single piece cleaning and drying machine is a high cleanliness cleaning and drying equipment, with the characteristics of liquid corrosion, pure water cleaning, high-speed drying, nitrogen drying and so on. Different wafer sizes can be achieved by quickly changing the drying head. It is the main equipment of wet cleaning process, small size and smooth operation. It is mainly used for the cleaning and drying process of 2-8 inch semiconductor wafers, mask plates, various substrates and other materials. It has the advantages of low cost, fast application and production.

1.2 Name: Single piece cleaning and drying machine

 

B.  Main structural features

Single piece cleaning dryer main servo motor, PLC controller, man-machine interface, high clean valve, PFA tube, nitrogen heater, anti-corrosion shell, and spin dry and other parts.

2.1 Material: Imported PP board, can meet the clean room working environment.

2.2 Special servo motor, can achieve 10-3000 RPM, low speed uniform cleaning, high speed centrifugal drying.

2.3 Industrial PLC controller and man-machine interface, stable and reliable control of each component, intuitive and visual operation mode.

2.4 High-power nitrogen heater, fast heating nitrogen, improve drying efficiency.

2.5 Drying head details can be customized according to customer needs for different sizes of drying head.

2.6 It can be configured with multiple groups of liquid medicine flushing, and has the function of liquid medicine suction.

 

C. Main technical parameters

 

Project	Main performance indicators and parameters
Processing wafer size	2-8 inch discs
Quantity of drying per session	One piece
Number of stations (units)	one
Liqour tank	two
Liquid heating	equip
Liquid spray nozzle	two
Pure water nozzle	one
Nitrogen nozzle	one
rotational speed RPM/MIN	10-3000
Wash and dry time	2-5min
Chamber and nitrogen heating method	Electric heater
nitrogen gas pressure	0.25Mpa, nitrogen pipe connector 6mm
Pure water pressure	0.15Mpa, pipe interface 6mm
Drain pipe	12mm sleeve connector
Control system	PLC programmable controller
Display	4.3-inch touch screen
Power supply	220V
Machine power	2KW
Dimensions (D * W * H)mm	D 420mm*W 420mm*H 535mm

 

 

Exhibition & Customers

Field Application

 

Packaging & Shipping

 

After Sales Service

 

FAQ

Q1:How to choose a suitable machine?
A1:You can tell us the working piece material, size, and the request of machine function. We can recommend the most suitable machine according to our experience. 

Q2:What is the warranty period for the equipment?
A2:One year warranty and 24 hours online professional technical support.

Q3:How to choose a suitable machine?
A3:You can tell us the request of machine function. We can recommend the most suitable machine according to our experience.